KCS

Recently photocatalytic activity of ZnO has been investigated widely. ZnO thin films were deposited on glass and Si wafer substrates by RF magnetron sputtering. We have prepared ZnO thin films with changing RF power and Ar gas flux. The surface properties of as-sputtered ZnO thin films were studied using SEM, AFM, XRD, XPS. And we studied on wettability of as-sputtered ZnO thin films by measuring of contact angle. After these thin films were irradiated by UV light, these were investigated using previous analysis to know photocatalytic activity of ZnO thin films. Wettability of ZnO thin films were changed from hydrophobic surface to hydrophilic surface by UV light. We compared variation of photocatalytic activity and surface properties of ZnO thin films before and after irradiation of UV light.