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  • 08월 28일 16시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

Study on photocatalytic activity of ZnO thin films by RF magnetron sputtering

등록일
2008년 8월 12일 11시 52분 01초
접수번호
1300
발표코드
31P128포 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
목 <발표Ⅱ>
발표형식
포스터
발표분야
물리화학
저자 및
공동저자
김명화, 남상훈, 부진효
성균관대학교 화학과, Korea
Recently photocatalytic activity of ZnO has been investigated widely. ZnO thin films were deposited on glass and Si wafer substrates by RF magnetron sputtering. We have prepared ZnO thin films with changing RF power and Ar gas flux. The surface properties of as-sputtered ZnO thin films were studied using SEM, AFM, XRD, XPS. And we studied on wettability of as-sputtered ZnO thin films by measuring of contact angle. After these thin films were irradiated by UV light, these were investigated using previous analysis to know photocatalytic activity of ZnO thin films. Wettability of ZnO thin films were changed from hydrophobic surface to hydrophilic surface by UV light. We compared variation of photocatalytic activity and surface properties of ZnO thin films before and after irradiation of UV light.

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