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  • 08월 28일 16시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

Mechanistic Understanding of Surface Reactions

등록일
2008년 8월 12일 18시 20분 17초
접수번호
1505
발표코드
금27D6워 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 10시 : 55분
발표형식
워크샵
발표분야
물리화학 - Workshop on Surface and Interface Physical Chemistry
저자 및
공동저자
최철호
경북대학교 화학과, Korea
Surface chemistry on semiconductor surfaces has gained enormous popularity recently and the interest is still growing. This may be partially due to the tremendous potential of the new functionalities of synthetically modified surfaces. It is conceivable that, as the size of electronic devices based on crystalline silicon wafers shrinks, the surface characteristics of semiconductor materials become crucial for the proper functioning of devices. With the help of traditional organic and organometallic chemistry, a wide variety of new chemically modified silicon surfaces can be synthesized to provide fine tailoring of surface characteristics for a broad range of applications. In addition, to gain the control needed to fabricate an organic function into existing semiconductor technologies and ultimately to make new molecule-scale devices, a detailed understanding of the adsorbate surface as well as interfacial chemical reactions and their products at the atomic/molecular level is critical. To accomplish this, both novel experiments and theoretical investigations need to play a significant role in the advance of this emerging field. This talk begins with the theoretical methodologies adapted for surface studies and then proceeds to a consideration of the unique features of clean silicon surfaces. Then, the main focus is directed to the structures and reaction mechanisms of organic molecules on silicon surfaces.

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