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Properties of TiO2 Thin Films using Microwave Discharge with Plasma Surface Treatment

등록일
2005년 2월 17일 17시 59분 19초
접수번호
1068
발표코드
21P120포 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
토 <발표Ⅲ>
발표형식
포스터
발표분야
물리화학
저자 및
공동저자
조상진, 송용화, 배인섭, 부진효
성균관대학교 화학과,
We have deposited TiO2 thin films on glass using a single molecular precursor such as titanium (IV) iso-propoxide by sol-gel processing. In order to elevate photocatalytic activity of the as-grown TiO2 films, argon and oxygen plasma ignited by microwave discharge under vacuum condition was also used in the range of 100 – 300 W within 5 min. at room temperature. Photocatalytic activity was evaluated by the measurements of the UV/vis. irradiation, SEM, contact angle, XPS, and AFM analysis. In this work, the effect of the plasma on the improvement of hydrophilic property of photocatalytic has mainly been investigated. A superhydrophilic property and smooth surface morphology appeared in the UV light irradiation with O2 plasma treatment more than Argon plasma treatment. Based on this work, we confirmed that the oxygen MW plasma treatment method was very reliable method for the synthesis of TiO2 thin films with high catalytic performance.

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