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  • 02월 23일 15시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

Dual-Patterned Honeycomb Lines by Combination of Bottom-up & Top-down Lithography Using Photoresponsive Small Molecules

등록일
2009년 2월 12일 15시 17분 03초
접수번호
1283
발표코드
29P71포 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
목 <발표Ⅰ>
발표형식
포스터
발표분야
고분자화학
저자 및
공동저자
김정학, 서명은, 김상율
KAIST 화학과, Korea
We developed a novel dual-patterning process that combines a breath figure technique (bottom-up) and photolithography (top-down) using photoresponsive small molecules. The molecules self-assemble into a hierarchically ordered honeycomb structure followed by the spontaneous formation of supramolecular fibrillar networks. The structure was again patterned by exposure to UV through a photomask, which induced selective chemical crosslinking in the exposed region. After developing, honeycomb lines were obtained in a pre-defined way. This process is very promising in fabrication of “custom” honeycomb patterns, because it is simple, applicable to various substrates, and doesn’t need additional photoresists and processes.

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