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  • 02월 23일 15시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

Well-ordered nanostructures in block copolymer thin films as a template for nanofabrication

2009년 2월 16일 03시 51분 22초
목2I6심 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
목 15시 : 50분
고분자화학 - Recent Researches on Nano-Scale Structures of Polymeric Materials Using Synchrotron Radiation Sources I
저자 및
인하대학교 나노시스템공학부, Korea
The self-assembly of materials is emerging as a key process in the fabrication of functional materials on the nanometer scale, since it provides a powerful bottom-up route to well-organized structures. Block copolymers, one class of self-assembling materials, offer an attractive route to fabricating nanometer-scale structures due to the incompatibility and connectivity between their constituents. The ability to self-assemble into ordered arrays of nanoscopic elements makes block copolymers ideal templates for nanofabrication, especially, fabrication of organic-inorganic hybrid materials. Organic-inorganic nano-hybrid films have attracted attention due to potential applications in areas including nanolithographic masks, magnetic storage, catalyst supports, optoelectronics, etc. Specifically, to enhance the physical properties of nanoparticles (NPs), selective loading is an essential requirement, in which the number of NPs is controlled in the desirable domains. Also required is the well-defined control of the size and shape of NPs, because physical and chemical properties are determined by how metallic NPs are dispersed in the designed polymer structures. In this presentation, several strategies for achieving requirements mentioned above will be discussed. Detailed nanostructures are characterized by variuos methods including grazing incidence x-ray scattering (GISAXS), AFM and TEM. Consequently, block copolymer self-assembly provides a wide variety of nanostructures that can be used as a template for nanofabrication.