KCS

Nanoparticles have been studied for a wide range of applications in nanotechnology from drug delivery to emerging device fabrication. The Nanocoating can change the optical, chemical, and mechanical properties of nanoparticles. Since the size of nanoparticles is very small, their coating requires precise thickness control as well as high uniformity. Thus, ALD is an ideal coating technique. The TiO₂ particles were pressed into a copper grid using polished stainless steel dies and a manual press. The grid had 3.05mm diameter and 200 mesh. The TiO₂ particles were coated with HfO₂ atomic layer deposition. The ALD process carried out using tetrakis ethylmethyl amino hafnium and H₂O at 200 ℃. TEM images revealed TiO₂ particles encapsulated by conformal HfO₂ films with a thickness of ~ 16nm after 300 cycles. These TEM images are consistent with a HfO₂ ALD growth rate at 200 ℃ of 0.5 Å/ cycle.