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TiO2 Nanoparticle Coating by HfO2 ALD

등록일
2009년 8월 21일 17시 20분 25초
접수번호
1563
발표코드
35P147포 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 <발표Ⅳ>
발표형식
포스터
발표분야
분석화학
저자 및
공동저자
허진국, 박주연, 조준모, 강용철
부경대학교 화학과, Korea
Nanoparticles have been studied for a wide range of applications in nanotechnology from drug delivery to emerging device fabrication. The Nanocoating can change the optical, chemical, and mechanical properties of nanoparticles. Since the size of nanoparticles is very small, their coating requires precise thickness control as well as high uniformity. Thus, ALD is an ideal coating technique. The TiO2 particles were pressed into a copper grid using polished stainless steel dies and a manual press. The grid had 3.05mm diameter and 200 mesh. The TiO2 particles were coated with HfO2 atomic layer deposition. The ALD process carried out using tetrakis ethylmethyl amino hafnium and H2O at 200 ℃. TEM images revealed TiO2 particles encapsulated by conformal HfO2 films with a thickness of ~ 16nm after 300 cycles. These TEM images are consistent with a HfO2 ALD growth rate at 200 ℃ of 0.5 Å/ cycle.

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