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제106회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Fabrication of Cobalt Magnetic Nanostructures Using Atomic Force Microscope Lithography

등록일
2010년 8월 31일 15시 43분 23초
접수번호
1591
발표코드
Ⅲ-PHYS.P-236 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 <발표Ⅲ>
발표형식
포스터
발표분야
물리화학
저자 및
공동저자
주해나, 윤성훈, 조소희, 정혜수
한양대학교 화학과, Korea
The fabrication of magnetic metal nanostructures has attracted significant interest for possible applications in high-density data storage media, which has patterns of single dot arrays and stores one bit for each particle according to its magnetization direction. In order to fabricate large area high-density magnetic nanopatterns, several methods have been described using interference lithography, X-ray lithography, and nanoimprint lithography. In this study, we demonstrate the fabrication of cobalt magnetic nanostructures using atomic force microscope (AFM) lithography through the electrochemical reduction of cobalt ions coated on a surface. A cobalt ion containing film, a solution of cobalt (II) acetate in DMF was spin-coated on a Si substrate, on which self-assembled monolayers of n-tridecylamine∙hydrochloride were added as an intermediate layer to accomplish high spatial resolution in nanoscale. Desired cobalt nanopattern could be produced by tip-induced local reduction, and its physical and magnetic properties were analyzed by SEM, EDX, and MFM images.

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