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제107회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Demonstrations of ion selective mesoporous silica thin film and polypyrrole deposition into pores

등록일
2011년 2월 24일 16시 57분 06초
접수번호
1699
발표코드
Ⅲ-ELEC.P-360 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 <발표Ⅲ>
발표형식
포스터
발표분야
전기화학
저자 및
공동저자
강호석, 이호춘1, 곽주현2
KAIST Chemistry, Korea
1금오공과대학교 응용화학과, Korea
2KAIST 화학과, Korea
A composite electrode was synthesized by mesoporous silica thin film formation on indium tin oxide (ITO) glass electrode. The silica film was prepared from aqueous silica precursor, tetraethoxy orthosilicate (TEOS) sol solution, in presence of cetyltrimethylammonium bromide (CTAB) by silica deposition catalyzed by hydroxyl ion formed by electrochemical potential. In the silica film, the direction of pores are normal to the substrate and ions are permeable through film. The formation of the silica film is tested in various conditions, employing both potentiostatic and galvanostatic methods. The diameter of pores is 4-5nm and the thickness is 100-120nm in the film. After removal of CTAB from the film, ion accessibility to the substrate surface through the pores is demonstrated by cyclic voltammetry (CV) technique using anionic Fe(CN)63-/4- and Ru(bpy))32+/3+ redox couples as electrochemical probes. Polypyrrole (PPy) was deposited into pores in silica film from pyrrole solution by anodic deposition and the redox reaction of Ppy in the template is measured by means of CV analysis in aqueous solution.

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