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현재 가능한 작업은 아래와 같습니다.
  • 03월 07일 19시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제107회 대한화학회 학술발표회, 총회 및 기기전시회 Research Activities on PIII&D (Plasma Immersion Ion Implantation and Deposition) Technology at KIST

2011년 2월 25일 19시 57분 39초
KCS4-2 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
목 14시 : 30분
KCS School - 플라스마기술과 산업적 응용
저자 및
한국과학기술연구원 특성분석센터, Korea
PIII&D (Plasma immersion ion implantation and deposition) technology is a very promising surface modification technology to improve the materials surface properties. In PIII&D, plasma immersion ion implantation technique, which is a very effective way to implant gaseous ions into the materials surface, is combined with thin film deposition technique such as magnetron sputtering. Thin films can be simultaneously modified by high-energy ion bombardment during deposition to improve the film properties. Furthermore, by operating the magnetron sputter deposition in high-power pulsed mode synchronized with the high voltage negative pulse bias that is applied to the substrate, non-gaseous ions such as metallic ions can be effectively implanted into the substrate owing to the highly ionized plasma state of sputtered target atoms. At KIST, PIII and PIII&D technique have been applied to numerous fields for many years to modify materials surface, which includes improvement of wear property, shallow junction doping, polymer surface modification, application to SOI wafer manufacturing, quantum dot formation, application to artificial hip joint materials, etc. In this talk, the research activities and experimental results on PIII&D technology will be shown and discussed.