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  • 09월 12일 17시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제110회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Thermal Reaction of Allyl chloride with Trichlorosilane and their Mechanistic Aspects.

등록일
2012년 8월 30일 15시 59분 39초
접수번호
1409
발표코드
IND.P-139 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
10월 17일 (수요일) 16:00~19:00
발표형식
포스터
발표분야
공업화학
저자 및
공동저자
정영애, 한준수1, 강윤경, 유복렬1
상명대학교 화학과, Korea
1한국과학기술연구원 물질구조제어연구단, Korea
Thermal reaction of allyl chloride with Trichlrosilane was studied without catalyst at temperatures ranging from 170 to 250℃. In the reaction, the hydrosilylation reaction rate increases as the reaction temperature increases. The reaction of allyl chloride with Trichlorosilane at 250℃ for 1h afforded predominantly hydrosilylation and Si-C coupling products such as allyl tirichlorosilane, trichloro(3-chloropropyl)silane, 1,3-bis(trichlorosilyl)propane and (2-(5-(trichlorosilyl)-2-(trichlorosilylmethyl)pentyl) propane-1,3-diyl)bis(trichlorosilane). Thermal Si-C coupling reaction of Chloropropane with Trichlorosilane in order to investigate the its mechanism. The thermal reaction of Chloropropane with Trichlorosilane took place to give Si-C coupling products such as Trichloropropane, Tetrachlorosilane, etc. It was confirmed that Chloropropane of chloro was decomposed at a specific temperature. When 6-chloro-1-hexene was used instead of allyl trichlorosilane under same condition, the yields of hydrosilylation and Si-C coupling products were very similar to those obtained from the reaction of Allyl chloride with Trichlorosilane. It is expected that the thermal reaction of Allyl compounds with Trichlorosilane is Radical reaction. We will investigate the mechanism of this reaction.

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