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  • 09월 12일 17시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제110회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Synthesis of a Photo-cleavable PS-PMMA Block Copolymer Using a Bifunctional Living Radical Polymerization Initiator Bearing an ortho-Nitrobenzyl (ONB) Group

2012년 9월 5일 10시 56분 21초
POLY.P-109 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
10월 17일 (수요일) 16:00~19:00
저자 및
문봉진, 이정현1
서강대학교 화학과, Korea
1서강대학교 화학, Korea
These days, block copolymers are finding more values in fabricating nano-scale devices because the patterns and dimension derived from the block copolymer template can be easily and precisely controlled by varying the block size and polymer architecture. When a photo-cleavable group is introduced to the block copolymer, the resulting polymer provides greater potential in such applications because the selective removal of one domain after the self-assembly becomes much easier by simple light irradiation, which is otherwise quite challenging process. In this presentation, we have designed and synthesized a new photo-cleavable initiator that has two-orthogonal initiating groups. The initiator is based on a photo-cleavable ortho-nitrobenzyl (ONB) group and bears both ATRP- and NMRP-initiation sites. Introduction of an ONB group to the initiator enables us to obtain a photo-cleavable copolymer. Using the initiator, two kinds of living radical polymerizations, NMRP and ATRP, have been performed to give PS-ONB-PMMA with low polydispersity. Since ONB groups would be located at the interface of PMMA and PS, it will enable us to achieve selective cleavage and removal of PMMA by UV irradiation followed by rinsing with selective solvent. The resulting porous polystyrene membrane will have large surface area and can be applied in various fields.