abs

학술발표회초록보기

초록문의 abstract@kcsnet.or.kr

결제문의 member@kcsnet.or.kr

현재 가능한 작업은 아래와 같습니다.
  • 09월 06일 15시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제112회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Spatially Selective Electroplating on Native Oxide-Covered Amorphous Hydrogenated Silicon by Localized Illumination

등록일
2013년 8월 16일 12시 06분 41초
접수번호
0053
발표코드
ELEC.O-7 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 12시 : 10분
발표형식
구두발표
발표분야
전기화학 - Young Electrochemists Symposium
저자 및
공동저자
임성열, 권승용, 곽수홍, 정택동*
서울대학교 화학부, Korea
Electrodeposition on photoconductive amorphous hydrogenated silicon (a-Si:H) by localized illumination demonstrated. It is conventionally believed that the electrochemical fabrication of two-dimensional patterns needs pre-patterned electrodes or masks, and that the native oxide layer on Si substrates, which acts as an insulating barrier, should be carefully removed before the electrochemical processes. In this work, we show the electrochemical dot patterning of amorphous MoOySz and nanoparticles of Pt and CdSe, which were stable without any stabilizer and exhibited good adhesion to the oxide surface of a-Si:H. This process required neither pre-patterned electrodes nor masks. Photoelectrochemical measurements and electrochemical impedance spectroscopy revealed that electrochemical reduction in the presence of the native oxide film without etching to remove the oxide layer can be tuned via the potential applied, the duration of the potential pulse, and the pH of the electrolyte.

상단으로