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  • 09월 04일 17시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제114회 대한화학회 학술발표회, 총회 및 기기전시회 안내 The effect of Flory-Huggins interaction parameter (χ) on the self-assembled patterns of block copolymers containing poly(dimethylsiloxane) (PDMS)

등록일
2014년 9월 4일 16시 33분 47초
접수번호
1516
발표코드
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발표시간
금 10시 : 50분
발표형식
구두발표
발표분야
고분자화학 - New Trends in Polymer Chemistry
저자 및
공동저자
허윤형, 정재원, 정연식*
한국과학기술원(KAIST) 신소재공학과, Korea
The inherent feature-size limitations of optical lithography and the low throughput of electron-beam lithography have demanded the development of practical nanoscale fabrication methods. Directed self-assembly (DSA) based on block copolymers (BCPs) enables a simple, cost-effective, and scalable nanopatterning with a great advantage of good compatibility with optical lithography, which will significantly reduce facility investment cost. Important features of self-assembled pattern from the microphase separation of BCPs are largely determined by the Flory-Huggins interaction parameter (χ), such as the order-to-disorder transition temperature, interfacial width, periodicity, and chain mobility. For example, the equilibrium domain spacing (L), which determines the period, has a dependence on the χ parameter and the degree of polymerization (N), L ~ N2/3 * χ1/6. In this work, we demonstrated the effect of χ parameter on self-assembled patterns of BCPs. First, we selected poly(dimethylsiloxane) (PDMS) as one of two blocks of BCPs to increase etching selectivity because Si moiety can be converted to silica (SiOx) in oxygen plasma process. Second, we varied the other blocks to control the χ parameters and characterized the BCPs synthesized via radical polymerization using 1H-NMR, FT-IR and SEC. The BCPs are then annealed to self-assemble into well-ordered cylinders with 10 - 25 nm feature size. Finally, we investigated the relation between χ and size and quality (line edge roughness and line width roughness) of self-assembled pattern using the scanning electron microscopy (SEM).

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