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학술발표회초록보기

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제116회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Chemical behavior of non-visual on-line monitoring system in semiconductor manufacturing process

등록일
2015년 8월 27일 15시 09분 55초
접수번호
2028
발표코드
ANAL1.O-28 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
목 10시 : 48분
발표형식
구두발표
발표분야
분석화학 - Oral Presentation of Young Analytical Chemists I
저자 및
공동저자
강다연, 임흥빈*
단국대학교 화학과, Korea
Although semiconductor equipment industry is one of the high-profit fields integrated many state-of-art technologies, supporting material industry, its technical levels are not high as expected yet in our country. Since production efficiency and volume of chips have been improved by technical migration, the equipment control became very important for manufacturing process. So far, the efficiency control has been done by visual defect monitoring, However, it was revealed that the effect of non-visual defect on production loss is almost 30%. Therefore, a non-visual monitoring technique regarding on wafer contamination control and sample pre-treatment was developed in this work. Since the developed on-line monitoring system utilized various glassware, the chemical behavior of metal ions interested in the process was studied using ICP-MS, on the basis of lifetime of metal ions in acids.

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