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  • 08월 30일 20시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

Photonic Polymer Replicas of Multilayer Porous Silicon

등록일
2006년 8월 14일 21시 32분 47초
접수번호
0536
발표코드
25P47포 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
금 <발표Ⅱ>
발표형식
포스터
발표분야
무기화학
저자 및
공동저자
김지훈, 조성동, 손홍래
조선대학교 화학과,
Elaborate one-dimensional photonic crystals have been prepared from a variety of organic and biopolymers, which can be dissolved or melted, by templating the solution-cast or injection-molded materials in porous silicon dioxide multilayer (distributed Bragg reflector or rugate dielectric mirror) structures. Multilayered porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p++-type silicon wafer. Control of applied current density, duration of the etch cycle, and etchant solution composition can be tuned for their photonic characteristics. The resulting multilayer porous silicon films have been removed from the silicon substrate by an applying of electropolishing current to obtain a free-standing multilayer porous silicon. The surface free-standing multilayer porous silicon has been modified by the thermal oxidation. These free-standing films are very brittle. Photonic polymer replicas are prepared by casting of polymer solution onto a porous silicon dioxide multilayer. Then the porous silicon dioxide multilayer has been removed in DMSO/HF mixture solution.

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