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제124회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Growth of Carbon Nanotube by Microwave Plasma Enhanced Chemical Vapor Deposition(MPECVD) using Nickel Catalyst

등록일
2019년 8월 19일 19시 29분 44초
접수번호
0443
발표코드
PHYS.P-146 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
10월 17일 (목요일) 11:00~12:30
발표형식
포스터
발표분야
Physical Chemistry
저자 및
공동저자
Yu Jin Song, Changsoon Huh*
Applied Chemistry, Dong-Eui University, Korea
We have grown carbon nanotubes (CNTs) with a microwave plasma enhanced chemical vapor deposition (MPECVD) method, which has been regarded as one of the most promising candidates for the synthesis of CNTs. We have used argon (Ar) and hydrogen (H2) gas and acetylene (C2H2) as precursor for the growth of CNTs. Ni catalytic layer (10 nm thick) were deposited on the Ti coated Si substrate by RF magnetron sputtering method. In this work, we report the effects of heat treatment on the growth of CNTs, in which we have pretreated the Ni catalytic layer in different temperature (600, 650, and 700 ℃) and moderate microwave power (400W). We investigated the effect of pretreatment temperate of the Ni catalyst layer on the growing characteristics of MWCNTs. Adhesion of Ni (10 nm) is shown to influence the growth characteristics with Ni used as active catalysts. The images show Ni catalytic layer diameter and density are varied dependent on their pretreatment conditions. In order to determine the properties of CNTs, we performer scanning electron microscope(SEM), transmission electron microscopy(TEM), atomic force microscopy(AFM), and X-ray photoelectron spectroscopy(XPS) analysis.

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