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  • 09월 10일 16시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제124회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Fabrication of a Moth-Eye Structure via Polystyrene Nanosphere Lithography to Reduce Reflective Losses

등록일
2019년 8월 28일 16시 17분 34초
접수번호
1719
발표코드
INOR.P-114 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
10월 17일 (목요일) 11:00~12:30
발표형식
포스터
발표분야
Inorganic Chemistry
저자 및
공동저자
SeungJe Lee, Gang Yeol Yoo1, Woong Kim2, Young rag Do3,*
Department of Chemistry, Kookmin University, Korea
1Department of Advanced Materials Engineering, Korea University, Korea
2Division of Advanced Materials Engineering, Korea University, Korea
3Department of Bionano Chemistry, Kookmin University, Korea
Moth-eye structures offer the advantage of reducing reflective losses. Instead of the traditional polydimethylsiloxane (PDMS) stamping method, we fabricated such a structure on a glass substrate via a nano-sphere consisting of a hexagonal-closed-packing array in an attempt to improve the light extraction efficiency. These moth-eye structure patterns were fabricated by a combination of polystyrene (PS)-based nano-sphere lithography (NSL) and reactive ion etching (RIE). We confirmed the functionality of the moth-eye structure for use given their anti-fogging effect. The moth-eye structure was also investigated using a scanning electron microscope (SEM). The scattering effects of the nanostructure were measured by UV-vis spectroscopy and by reflectance measurements.

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