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09월 10일 16시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능
제124회 대한화학회 학술발표회, 총회 및 기기전시회 안내
Characterization of Various Refined Lacquer Saps with Analytical Techniques
2019년 8월 29일 16시 46분 27초
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10월 18일 (금요일) 11:00~12:30
, Jihye Lee
, Minhwa Kang
, Seung Wook Ham
, Yeon Hee Lee
Department of chemistry, Chung-Ang University, Korea
Advanced Analysis Center, Korea Institute of Science and Technology, Korea
Traditionally in Asian countries, lacquer sap was used as surface coating materials to protect, decorate and paste various materials such as wood, ceramic, paper and leather. The commonly used lacquer sap which is extracted from three main lacquer trees has mixtures of various catechol or phenol substitutes with C15 and C17 side chains such as urushiol, laccol and thitsiol. Lacquer was used in Korea for a long time and the research was needed to inherit the traditional heritage and to develop the usage by standardization and advancement. In this study, the chemical and physical properties of the raw lacquer saps were obtained from different countries: Korea, China, and Vietnam. And also refined lacquer sap by various refining time was investigated. The refinement was done by vaporizing water at room temperature and made to be homogeneous. The properties of refined lacquer was studied by purifying time period to investigate the change of components and physical properties. The lacquer films to determinate the physical characteristics were coated approximately 10 μm thick on 4 different materials: Si wafer, glass, acrylic panel and stainless steel plate, and were stored at 25 °C with 75% humidity. Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), High Performance Liquid Chromatography (HPLC), and Pyrolysis-Gas Chromatography-Mass Spectrometry (Py-GC/MS) were used to provide the structural information and contents of a series of catechol derivatives of three different countries lacquer. In addition, various analysis techniques were performed to measure the adhesion energy and hardness using peel tester, pencil hardness tester, Atomic Force Microscope (AFM) and Nano indenter.
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