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  • 09월 20일 16시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제126회 대한화학회 학술발표회 및 총회 In Situ Real-time Monitoring of Chemical Etching Process of ITO Film via Fourier-transform Electrochemical Impedance Spectroscopy

등록일
2020년 9월 17일 13시 58분 30초
접수번호
1130
발표코드
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발표시간
화 09시 : 30분
발표형식
구두발표
발표분야
Electrochemistry - Oral Presentation of Young Scholars in Electrochemistry
저자 및
공동저자
Seok Hee Han, Taek dong Chung*
Department of Chemistry, Seoul National University, Korea

Electrochemical impedance spectroscopy (EIS) has been deemed a powerful technique which gives a full knowledge of the electrode surface including faradaic and non-faradaic aspects. Fourier-transform electrochemical impedance spectroscopy (FT-EIS) allows us a time-resolved investigation of electrochemical systems, whereas conventional EIS is not applicable owing to its long measurement time. Here, we implemented FT-EIS using step-excitation signal for an in situ, real-time analysis during the entire chemical etching process of ITO film electrode under FeCl3-HCl solution, which is frequently used in most cases. We successfully visualized the electrochemical activation of ITO electrode as the etching progressed, as well as the completion of the process by continuously monitoring the fluctuation of equivalent circuit parameters, i.e. charge transfer resistance (Rct), double layer capacitance (Cdl), which were simultaneously calculated from the FT-EIS data. We verified a similar tendency in electrochemical aspects from the cyclic voltammograms and impedance data obtained from ferri- and ferrocyanide redox couple. We further applied this technique to procure undamaged interdigitated array (IDA) bearing more delicate patterns by preventing the excessive etching. The technique could also be used to optimize the etching procedure, or to prepare electrodes with desired activity, and even to screen out abnormalities. This work lets us rediscover the potential of FT-EIS enabling in situ real-time electrochemical examinations in other constantly changing, transient systems such as electrodeposition, corrosion and surface modification.


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