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Depth profiling of Cr/Ni multi layers with Glow Discharge Spectrometer

등록일
2007년 2월 13일 13시 44분 21초
접수번호
1161
발표코드
목12G2심 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
목 13시 : 55분
발표형식
심포지엄
발표분야
분석화학 - Advanced Analytical Techniques
저자 및
공동저자
원미숙, 윤장희
한국기초과학지원연구원 부산센터,
Glow Discharge Spectrometer (GDS) is a rapid and easy-to-use surface-analysis instrument. Employing the high-frequency glow discharge method, the analyzer enables the surface analysis of non-conductive samples. It also enables analysis of elements H to U. The analyzer allows rapid elemental analysis in the depth direction through Ar sputtering at a velocity of approximately 1 to 10 m/min. In contrast to surface analysis instruments such as XPS, Auger, and SIMS, the analyzer does not require a high vacuum for measurement. To design a thin film device, it is very important to obtain the elemental information on a sample depth. In this study, the experimental parameters for the depth profiling using XPS, AES, and GDS were optimized and compared the results. The film thickness was measured with TEM. Almost same depth resolution(~7 nm) obtained for the analytical tools used this study. The choice of an analytical tool for the depth profiling is highly dependant on the characteristics of the sample; film thickness, conducting property, included elements, etc.

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