|
Type |
Symposium |
Area |
Self-assembly of Inorganic Molecules and Nanoparticles |
Room No. |
401호 |
Time |
FRI 10:00-: |
Code |
INOR1-3 |
Subject |
Sequentially Self-Limited Molecular Layer Deposition of Uniformly Aligned Polymer Films |
Authors |
이진석 숙명여자대학교 화학과, Korea |
Abstract |
Vapor-phase molecular layer deposition (MLD) is a powerful technique for fabricating conformal ultra-thin organic films with controlled composition and thickness at the molecular level. Although various organic films have been developed over the past two decades using MLD such as polyamide, polyimide, polyurethane, and polyurea, many researchers have focused on MLD growth processes including self-limiting surface reactions and factors that control the film thickness and composition. In order to completely understand the unique properties of organic films, it is necessary to investigate the molecular interaction and orientation in these films in detail.
In this presentation, I will present uniformly aligned polymer MLD films by repeating alternative vapor exposures of organic precursors for sequential and self-limiting surface reactions on SiO2 substrates. By integrating plane-polarized Fourier-transform infrared (FTIR) and Raman spectroscopic tools, we demonstrated the uniform alignment of polymer MLD films, which corresponded well with density functional theory (DFT) calculations. Furthermore, the polymer MLD films were fabricated using different carbon chain length and bond type of hydrocarbons to compare the molecular orientations of thin film, which investigated by grazing incidence wide angle X-ray scattering (GIWAXS). |
E-mail |
jinslee@sookmyung.ac.kr |
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