|
|
| Type |
Symposium |
| Area |
R&D beyond Carbon Society I |
| Room No. |
Room 301 |
| Time |
THU 14:50-: |
| Code |
ENVR-3 |
| Subject |
Oxidation of CO, toluene and acetaldehyde catalyzed by mesoporous-template-supported NiO and Fe2O3 nanoparticles prepared by vapor deposition methods |
| Authors |
Young Dok Kim
Department of Chemistry, Sungkyunkwan University, Korea |
| Abstract |
Atomic layer deposition (ALD) is a widely used technique in the semiconductor industry for the fabrication of ultrathin films. Recently, application of this technique has been extended to the incorporation of catalytically active nanoparticles within mesoporous structures. On the other hand, temperature-regulated chemical vapor deposition (TR-CVD) has been recently shown to be as effective as ALD for insertion of nanoparticles into the mesoporous templates. In this talk, recent progress in synthesis of nanocatalysts based on ALD and TR-CVD will be shortly reviewed. NiO or Fe2O3 nanoparticles could be incorporated into mesoporous SiO2 and Al2O3 substrates and not only the surface topmost part of the substrate particles but also deeper layers with a depth of several tens to hundreds of micrometer could be decorated by NiO or Fe2O3 nanoparticles. The catalysts prepared in this way were shown to be highly active for low temperature CO, acetaldehyde and toluene oxidation Particularly, unique structure of our catalysts consisting of nanoparticles confined within mesopores showed high stability of catalytic activity as well as resistance to poisoning by SO2. X-ray Photoelectron Spectroscopy was used to shed light on the structure of active sites of each catalyst for various reactions, which will be reviewed in this talk.
|
| E-mail |
ydkim91@skku.edu |
|
120th General Meeting of the KCS