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| Type |
Poster Presentation |
| Area |
Analytical Chemistry |
| Room No. |
Exhibition Hall 2+3 |
| Time |
10월 19일 (목요일) 11:00~12:30 |
| Code |
ANAL.P-198 |
| Subject |
Analysis of defect mechanism using Micro-IR |
| Authors |
young woong Ahn
Research Team of Total analysis, KCC Central Research institute, Korea |
| Abstract |
The FT-IR method is fast, sensitive and has the advantage of not being difficult to sample. In addition, the equipment is easy to operate and can be applied to various fields such as chemical structure analysis, quantitative analysis and reaction analysis by attaching various attachments.
In the case of Micro-IR, a high-resolution microscope can be mounted on the IR to be used for defect analysis such as garbage and Cratering of coating specimens, analysis of impurity substances in fine areas, image mapping, and interlayer composition analysis of multi-layer structures.
In this study, various defective specimens were analyzed and the causes of defects were identified and classified by type. Defects caused by foreign matter, contamination transfer, and film loss were detected the most, and it was confirmed that analysis of the interlayer composition was possible by analyzing the specimen of multi-layer structure
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| E-mail |
chemistywan@gmail.com |
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120th General Meeting of the KCS