|
Type |
Poster Presentation |
Area |
Physical Chemistry |
Room No. |
Event Hall |
Time |
4월 20일 (금요일) 11:00~12:30 |
Code |
PHYS.P-93 |
Subject |
TOF-SIMS of OLED materials with 20 keV Ar gas cluster ion beam projectiles |
Authors |
JI YOUNG BAEK, Chang Min Choi* Korea Basic Science Institute, Korea |
Abstract |
For efficient analysis of various organic samples by the Ar gas cluster ion beam (Ar-GCIB), we investigated the parameters of GCIB such as optimal cluster size, ion beam current and so on using commercial TOF-SIMS. In this study, OLED materials were used for analysis, such as Alq3, HAT-CN, TAPC, and TPBi. Analysis of OLED samples was performed using TOF-SIMS V mass spectrometer (ION-TOF GmbH, Münster, German). We used 20 keV Arn-GCIB and adjusted the Ar cluster size from 800 to 2400 at 200 intervals to find the appropriate analysis conditions. Different mass spectra of secondary ions generated from OLED samples were obtained. With the variation of control parameters of the GCIB, the ratio of secondary ion intensity between parent and fragment ions has been investigated by TOF-SIMS. In case of Alq3, HAT-CN, and TPBi, the fragmentation ratio decrease as a Ar cluster size increase. However, in case of TAPC, the fragmentation ratio increase. To understand this result, the CID (collision induced dissociation) analysis with 15T FT-ICR MS was performed to observe the fragmentation pattern of OLED materials. The fragmentaton pattern shows a dependence of collisional energy. We will present the characteristics of GCIB analysis at the OLED samples. |
E-mail |
jiyoung2062@kbsi.re.kr |
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