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|
| Type |
Symposium |
| Area |
Symposium for Polymer Division 30th Anniversary |
| Room No. |
Room 325C+D |
| Time |
THU 16:40-: |
| Code |
POLY1-4 |
| Subject |
A Glimpse of Photoresist Materials Chemistry in Advancing Photolithography during the Last 30 Years |
| Authors |
Kwang-Duk Ahn
Korea Institute of Science and Technology, Korea |
| Abstract |
|
| E-mail |
kdahn@kist.re.kr |
|
122nd General Meeting of the KCS