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|
| Type |
Poster Presentation |
| Area |
Polymer Chemistry |
| Room No. |
Grand Ballroom |
| Time |
10월 18일 (목요일) 11:00~12:30 |
| Code |
POLY.P-22 |
| Subject |
Synthesis and Characterization of Self-Polishing Polyurethane Copolymers |
| Authors |
Jeong Yong Park, Do-Hoon Hwang*
Department of Chemistry, Pusan National University, Korea
|
| Abstract |
One of effective strategies in self polishing industries is containing a zinc arcylate monomers. In this work, we synthesized and designed self-polishing polyuretane copolymers to enhance their adhesion to the surface. Synthesized polyurethane based copolymers were investigated by Fourier transform infrared (FT-IR) and inductively coupled plasma optical emission spectrometry (ICP-OES). The properties of polyurethane based copolymers containing Zn were compared with the zinc-free polyurethane as reference. The polishing rate was determined by measuring the film thickness after dynamic ummerstion tests. Compared with the zinc-free polyurethane, the experimental results demonstrate that polyurethane based self-polishing copolymers copolymers show good self-polishing properteis and adhesion to the surface. |
| E-mail |
pjy9189@naver.com |
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122nd General Meeting of the KCS