|
Type |
Symposium |
Area |
Special Symposium by Leading Mid-career Polymer Scientists |
Room No. |
Room 403 |
Time |
THU 16:40-17:10 |
Code |
POLY1-3 |
Subject |
Imaging Behavior of Highly Fluorinated Materials under Electron-Beam and Extreme UV Radiation |
Authors |
Jin-kyun Lee Department of Polymer Science & Engineering, Inha University, Korea |
Abstract |
In this presentation, I propose a new concept of organic small molecule-based extreme UV (EUV) resist materials that do not require sub-stoichiometric ingredients. Based on the previous results with highly fluorinated electron-beam resists, it was possible to designe amorphous small molecules equipped with perfluoroalkyl ether chains. The synthesis of the prototype was carried out successfully, and its physical properties, imaging mechanism, and performance were all evaluated under electron beam exposure conditions. Although the prototype showed slightly low sensitivity to EUV irradiation, I was able to mitigate the issue by appending other cross-linkable functional moieties. The modified version showed decent negative-tone patterning performance under e-beam exposure and could form images under EUV irradiation and the pattern development step using highly fluorinated solvents. |
E-mail |
jkl36@inha.ac.kr |
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