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107th General Meeting of Korean Chemical Society Research Activities on PIII&D (Plasma Immersion Ion Implantation and Deposition) Technology at KIST

Submission Date :
2 / 25 / 2011 , 19 : 57 : 39
Abstract Number :
107022517496
Presenting Type:
Symposium
Presenting Area :
KCS School - 플라스마기술과 산업적 응용
Authors :
한승희
한국과학기술연구원 특성분석센터, Korea
Assigned Code :
KCS4-2 Assigend Code Guideline
Presenting Time :
목 14시 : 30분
PIII&D (Plasma immersion ion implantation and deposition) technology is a very promising surface modification technology to improve the materials surface properties. In PIII&D, plasma immersion ion implantation technique, which is a very effective way to implant gaseous ions into the materials surface, is combined with thin film deposition technique such as magnetron sputtering. Thin films can be simultaneously modified by high-energy ion bombardment during deposition to improve the film properties. Furthermore, by operating the magnetron sputter deposition in high-power pulsed mode synchronized with the high voltage negative pulse bias that is applied to the substrate, non-gaseous ions such as metallic ions can be effectively implanted into the substrate owing to the highly ionized plasma state of sputtered target atoms. At KIST, PIII and PIII&D technique have been applied to numerous fields for many years to modify materials surface, which includes improvement of wear property, shallow junction doping, polymer surface modification, application to SOI wafer manufacturing, quantum dot formation, application to artificial hip joint materials, etc. In this talk, the research activities and experimental results on PIII&D technology will be shown and discussed.