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학술발표회초록보기

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  • 03월 02일 17시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제109회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Etching effect of AZO film for efficiency improvement of solar cell

등록일
2012년 3월 1일 04시 12분 10초
접수번호
1541
발표코드
PHYS.P-523 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
4월 25일 (수요일) 18:00~21:00
발표형식
포스터
발표분야
물리화학
저자 및
공동저자
정원석, 부진효
성균관대학교 화학과, Korea
The etching of glasses in aqueous hydrofluoric acid (HF) solutions in applied in many technological fields. Particularly, the textured transparent conductive oxide (TCO) materials on the glass substrate etched by HF were used to improve the current density of solar cell. In this study, the textured glass substrate has been etched by solution and the Al doped ZnO (AZO) thin films have been prepared on this textured glass substrates by magnetron sputtering method. After the AZO film deposition the surface of AZO has been etched by hydrochloric acid (HCl). We observed morphology in AZO films by using different etchant concentration and etching time. Etched AZO thin films had a lower resistivity and higher haze. The etching rate of AZO film is proportional exponentially to pH value. Increases in the surface root-mean-square roughness of AZO films from 53.78 nm to 84.46 nm enhanced haze ratio in above 700 nm wavelength. The process could be applicable in texturing glass and etching AZO surface to fabricate solar cell in industrial scale.

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