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제114회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Molecular Layer Deposition of Organic-Inorganic Alucone Films using Trimethylaluminum and Alkanediols with Different Alkyl Chains

등록일
2014년 8월 28일 14시 29분 09초
접수번호
0986
발표코드
INOR.P-223 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
10월 15일 (수요일) 16:00~19:00
발표형식
포스터
발표분야
무기화학
저자 및
공동저자
박이슬, 조보람1, 이진석*
숙명여자대학교 화학과, Korea
1한양대학교 화학과, Korea
Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique typically uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. We fabricated organic-inorganic nanohybrid thin films using trimethylaluminum and alkanediols by a sequential, self-limiting surface chemistry process known as molecular layer deposition (MLD). Using ellipsometry, we confirmed linear growth of the films versus number of MLD cycles at all same temperature. But this tendency of linear growth of the films versus number of MLD cycles is confirmed to reduce with increasing of the number of alkyl chains. Atomic force microscopy was also used to check the roughness of the films that showed the roughness increased with increasing of the number of alkyl chains. Contrary, the film density decreases with increasing of the number of alkyl chains.

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