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학술발표회초록보기

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제114회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Fluorous Solvent-Soluble Imaging Materials containing Anthracene Moieties

등록일
2014년 8월 28일 15시 47분 39초
접수번호
1139
발표코드
POLY.P-64 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
발표시간
10월 15일 (수요일) 16:00~19:00
발표형식
포스터
발표분야
고분자화학
저자 및
공동저자
손종찬, 이진균*
인하대학교 고분자공학과, Korea
Manufacture of organic electronic devices has been drifted toward solution processing of active materials. To realize this, several issues need to be overcome in particular patterning matter. Conventionally, organic electronics is fabricated by photolithographic techniques and organic solvents are used as coating solvent, developer and stripper. However, when this technique is applied to organic based devices, organic solvents in the process may permeate into organic components beneath photoresist film. Furthermore, debris following decomposition reaction by UV irradiation to photoresist and photo acid generator can be potential threat causing deterioration of materials’ performance. In order to resolve these problems, we designed a highly fluorinated photoresist polymer [ copolymerization of 6-(anthracene-9-yl)hexyl methacrylate (AHMA) and semi-perfluorodecyl methacrylate (FDMA) ] taking advantage of orthogonal patterning. Through merits of orthogonal process that minimizes chemical interaction between fluorous solvents and organic devices and photo-dimerization without photo acid generater, we examined photolithography on organic electronic devices. Synthesis of P(AHMA-FDMA) by random radical polymerization and Lithographic evaluation were reported. Finally, P(FDMA-AHMA) and fluorous solvents were applied to the photolithographic patterning of OLED pixels.

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