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  • 09월 01일 18시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제118회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Improvement of AFM lithography system and studying characteristics of nano-indentation AFM lithography

2016년 9월 1일 07시 28분 59초
PHYS.O-6 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
목 09시 : 50분
물리화학 - Oral Presentation for Young Scholars in Physical Chemistry
저자 및
김정환*, 전승희1
한국기초과학지원연구원 질량분석장비개발팀, Korea
1(주)나노포커스 기술연구소, Korea
New nanolithography method such as nano-imprint and atomic force microscopy (AFM) nanolithography has the potential value to be future low-cost techniques for nano-scale patterning and fabrication. Nano-indentation lithography using AFM is promising to create nano-structures owing to the ability of both a precise pattering and an in-situ measurement simultaneously. In this study, we have improved the performance of the XYZ scanner of existing commercial AFM system for nano-indentation. Newly designed scanner shows a better precision and reliability for producing nano-pattern than that of original system. Close loop control of XY scanner provides a minimal distortion of pattern shape created by nano-indentation AFM lithography. The new type of scanner shows an enhanced orthogonality and a low cross-coupling of XY and Z, therefore it provides more accuracy and sophisticated control of AFM tip. We also have upgraded a various tip control algorithm and user interface for editing patterns. We have studied the relationship between a pattern shape and indentation parameters. The characteristics of the unique nano-indentation method and its applications will be discussed in detail.