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  • 09월 01일 18시 이후 : 초록수정 불가능, 일정확인 및 검색만 가능

제118회 대한화학회 학술발표회, 총회 및 기기전시회 안내 Organic-inorganic nano-laminate for gas diffusion barrier by molecular layer deposition and atomic layer deposition

2016년 9월 1일 13시 16분 53초
MAT.P-626 이곳을 클릭하시면 발표코드에 대한 설명을 보실 수 있습니다.
10월 14일 (금요일) 11:00~12:30
저자 및
윤관혁, 성명모*
한양대학교 화학과, Korea
Organic light-emitting diodes (OLEDs) are the attractive candidates for the flexible electronics. However, being extremely sensitive to air and moisture, the OLED based-devices should be encapsulated with transparent barrier film having ultra-low water vapor permeability. The present work reports a novel barrier thin film consisting of alternative layers of self-assembled organic layer and alumina exhibiting high mechanical flexibility and ultra-low water vapor permeability. The barrier films are deposited using the combined molecular layer deposition and atomic layer deposition technique at the same reaction chamber at 80 °C to obtain homogeneous and conformal coating to a large area. The barrier performance of the gas-diffusion barrier was determined by Ca conductance and Ca dot array tests. At optimized thickness ratio of 1:2 for the SAOLs/Al2O3 nano-laminate film with total 100 nm thickness of the Al2O3 layer, the barrier film demonstrates the ultra-low water vapor transmission rate of 2.99×10-7 g/m2day, which is the lowest permeability achieved by the thin and transparent gas-diffusion barriers reported so far. Based on the outstanding barrier properties with good flexibility and transparency, the nano-laminated film was applied to the commercial OLED panels as a gas-diffusion barrier film. The results indicate the enhanced durability of the panels with significant prevention on defect propagation by thin SAOLs layers.